Hosted by Mihaela Kim | CLO 3D to Pattern Workshop

Edit a digital garment to your measurements and create a usable pattern

Date: Saturday, December 19, 2026 | 5:00‒8:00 PM

See your garment in 3D, adjust the fit digitally, and create a pattern for sewing—edited to your own measurements.

This practical workshop connects digital garment visualization with real-world construction, helping you move from a CLO 3D design to a pattern you can use at the sewing machine. You’ll work through the process of evaluating fit in a digital environment, making measurement-based adjustments, and preparing the resulting garment for pattern development. It’s an ideal next step for anyone who wants to turn digital experimentation into a sewable garment.

You’ll learn how to:

• Review a garment and its fit in CLO 3D
• Adjust the design to your own measurements
• Make digital fit and proportion changes
• Develop a sewing pattern from the digital garment
• Prepare your edited pattern for real-world garment construction

Best for: Sewers, designers, and makers who want to connect CLO 3D design with custom fit patternmaking